Center Layout & Apparatus(1)
CTFTA is a 3 story building with area of 1,056 m2. It contains 10 individual experimental sections, including Advanced physical Vapor Deposition Lab(Ⅰ), Advanced Chemical Vapor Deposition Lab, Advanced physical Vapor Deposition Lab(Ⅱ), Thin Films & Mechanical Properties Testing Lab, Advanced Plasma Lab, Optoeletronic Measurement Lab, Industry Process Lab, Production Testing Equipment Lab, Solution Plasma Lab, as well as an office room and a multi-function meeting room.
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Advanced Chemical Vapor Deposition Lab. |
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Inductively Coupled Plasma-Chemical Vapor Deposition, ICP-CVD
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Plasma Enhanced -Chemical Vapor Deposition, PE-CVD
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Advanced Physical Vapor Deposition Lab.Ⅰ |
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In- Line Physical Vapor Deposition
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Batch Type Physical Vapor Deposition
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Advanced Physical Vapor Deposition Lab.Ⅱ |
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High Power Impulse Magnetron Sputtering, HIPIMS
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Thin Films & Mechanical Properties Testing Lab. |
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Scratch Tester
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Tribometer
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Thin Film Impact Tester
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Advanced Plasma Lab. |
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Plasma Polymerization System
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Optoeletronic Measurement Lab. |
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Photoelectrochemical Measuring System
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UV-Visible Spectrophotometer
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Atmospheric Plasma Treatment System
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Industry Process Lab. |
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Ion-Beam Assisted Deposition, IBAD
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Reactive Ion Etcher, RIE
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Deposition System
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Organic-inorganic hybrid coating system
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Industry-Testing Equipment Lab. |
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3D print
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Electro-spinning
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Hot filament plasma enhanced chemical vapor deposition, HF-PECVD
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Solution Plasma Lab. |
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Solution Plasma System
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Plasma Surface Engineering Lab. |
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Hybrid Coating System
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Functional Atmospheric Plasma Lab. |
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Bio-Plasma System
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Denso Robot
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Plasma Surface Engineering Lab. |
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Hybrid Coating System
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Functional Atmospheric Plasma Lab. |
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Bio-Plasma System
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Denso Robot
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