[Doctoral Qualifying Examination] Ming Chi University of Technology, Academic Year 115, Semester 1, International Doctoral Degree Program in Plasma and Thin Film Engineering, Doctoral Qualifying Examination
International Ph.D. Program in Plasma and Thin Film Technology Information on the Ph.D. Qualifying Examination
1. Examination Date
Tuesday, September 29, 2026
2. Examination Venue
Room 3-306, Building 3, Center for Plasma and Thin Film Technologies
3. Examination Subjects and Scope
(1) Examination Subjects (Two Subjects)
- Plasma and Thin Film Technology
- Materials Science and Engineering
(2) Examination Scope
Please refer to the question banks for the examination scope of each subject:
https://cptft.mcut.edu.tw/p/412-1019-10846.php?Lang=zh-tw
4. Examination Schedule
The examination duration for each subject is 100 minutes.
|
Subject |
Time |
|
Plasma and Thin Film Technology |
13:00–14:40 |
|
Materials Science and Engineering |
15:00–16:40 |
5. Application Deadline
Monday, August 31, 2026
Eligible Ph.D. students must complete the application process by the deadline. Late applications will not be accepted.
If you have any questions, please contact the secretary of the International Ph.D. Program in Plasma and Thin Film Technology.
