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[Doctoral Qualifying Examination] Ming Chi University of Technology, Academic Year 115, Semester 1, International Doctoral Degree Program in Plasma and Thin Film Engineering, Doctoral Qualifying Examination

update date : 2026-08-06

International Ph.D. Program in Plasma and Thin Film Technology Information on the Ph.D. Qualifying Examination

1. Examination Date

Tuesday, September 29, 2026

2. Examination Venue

Room 3-306, Building 3, Center for Plasma and Thin Film Technologies

3. Examination Subjects and Scope

(1) Examination Subjects (Two Subjects)

  1. Plasma and Thin Film Technology
  2. Materials Science and Engineering

(2) Examination Scope

Please refer to the question banks for the examination scope of each subject:
https://cptft.mcut.edu.tw/p/412-1019-10846.php?Lang=zh-tw

4. Examination Schedule

The examination duration for each subject is 100 minutes.

Subject

Time

Plasma and Thin Film Technology

13:00–14:40

Materials Science and Engineering

15:00–16:40

5. Application Deadline

Monday, August 31, 2026

Eligible Ph.D. students must complete the application process by the deadline. Late applications will not be accepted.

If you have any questions, please contact the secretary of the International Ph.D. Program in Plasma and Thin Film Technology.

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