講座主題 Lecture topic : 高速氣流濺鍍的原理和應用 Gas flow sputtering- Principle & Applications

講座時間 Time :04/16 (TUE.) 1:00-4:00 PM

講座地點 Location :R301 meeting room 3F,Center for Plasma & Thin Film Technologies

講者 Speaker :Prof. Ju-Liang He

Distinguished Professor,Department of Materials Science and Engineering, Feng Chia University