The International Plasma Technology Joint Conference 2025 (IPTJC2025) is a prestigious event that gathers researchers and engineers worldwide, which will be held during June 25 to 28, 2025 at Ming Chi University of Technology, New Taipei, Taiwan. This conference combines three famous international conferences: the Global Plasma Forum from Japan, the International Workshop on Plasma Cryo Etching Processes (PlaCEP) from Europe, and the International Forum in Plasma and Thin Film Technologies for Sustainable Development Goals (PTSDG) from Taiwan. The conference covers various plasma, plasma etching, coating, thin film, surface engineering, and surface modification subjects, making it an important event for researchers and engineers from academia, industry, and research laboratories.

More than 300 abstract submissions including invited and contributed papers as well as posters are expected to be presented, and around 400 researchers and engineers from more than 20 countries are expected to participate in the grand event.

The IPTJC2025 features three important symposia and one short course, namely:

A. Low temperature and cryogenic plasma etching technology
A-1. Cryogenic etching processes of silicon (deep etching...)
A-2. Cryogenic etching of dielectrics (3D NAND...)
A-3. Cryo-atomic layer etching
A-4. Conventional plasma etching techniques
A-5. Modeling and simulation of plasma etching processes

B. Plasma technology
B-1. Plasma for agriculture and biomedical applications
B-2. Plasma for catalysis and nano-processes
B-3. Plasma for environmental issues (e.g. water and gas treatment, recycling)
B-4. Plasma simulation and modeling
B-5. Scrape-off Layer (SOL)/diverter plasmas and plasma-wall interactions (PWI)
B-6. Data-driven, green digital transformation (DX) plasma

C. Thin film and coating technology for sustainable development goals
C-1. Surface engineering (PVD, CVD; spraying, nitriding, and others) to achieve progress in energy saving, harvesting, carbon reduction, and sustainable development goals.
C-2. Low-impact materials (non-toxic, recycled materials) for the surface and intermediate steps 
C-3. Thin film and coating technology for advanced semiconductors, carbon materials, and nanomaterials
C-4. Thin film and coating technology for biomaterials, optical materials
C-5. Thin film and coating technology for protective, anti-corrosion, high-temperature, and severe environment applications

SC. Short course:
IPTJC2025 will invite renowned international scholars recommended by the American Vacuum Society (AVS), Global Plasma Forum, and PlaCEP to conduct a six-hour short course on the first day of the conference. The course aims to provide educational training for participants in professional technical areas including plasma technology, thin film technology, and materials analysis techniques.

It is our pleasure to announce the International Plasma Technology Joint Conference 2025 (IPTJC2025). We cordially invite you to attend the conference. Look forward to seeing you at IPTJC2025 in New Taipei City, Taiwan.

Best regards,