Jump to the main content block

 

 

 

Center Layout & Apparatus

The total surface area of CPTFT is 1,389 m2. CPTFT contains 15 individual experimental sections, including Advanced physical Vapor Deposition Lab, Advanced Chemical Vapor Deposition Lab, Advanced physical Vapor Deposition Lab, Thin Films & Mechanical Properties Testing Lab, Advanced Plasma Lab, Optoelectronic Measurement Lab, Industry-Processing Lab, Industry-testing Equipment Lab, Applied Biological Thin Films Lab, Liquid Plasma Lab, Plasma Surface Engineering Lab, Functional Atmospheric Plasma Lab, Plasma & Vacuum Technology Training Lab, Corrosion Prevention & Control Lab, Thin Film And Material Simulation Lab, as well as an office room and a multi-functional meeting room.

 

 Advanced Chemical Vapor Deposition Lab.

Inductively Coupled Plasma-Chemical Vapor Deposition, ICP-CVD 

 

 Advanced Physical Vapor Deposition Lab.Ⅰ

 In- Line Physical Vapor Deposition

 Batch Type Physical Vapor Deposition

 

 

 Advanced Physical Vapor Deposition Lab.Ⅱ

High Power Impulse Magnetron Sputtering, HIPIMS

 

 Thin Films & Mechanical Properties Testing Lab.

Scratch Tester

Tribometer

Thin Film Impact Tester

 

Advanced Plasma Lab.

Plasma Polymerization System

 

Optoeletronic Measurement Lab.

Photoelectrochemical 

Measuring System

UV-Visible Spectrophotometer)

 

Atmospheric Plasma Treatment System

 

Industry Process Lab.

 Ion-Beam Assisted Deposition, IBAD

 Reactive Ion Etcher, RIE

 Deposition System

 

 

 Organic-inorganic hybrid coating system

 

Industry-Testing Equipment Lab.

3D print

Electro-spinning

 

Solution Plasma Lab.

Solution Plasma System

 

Applied Biological Thin Films Lab.

Laminar Flow

Microscope

 

 

Plasma Surface Engineering Lab.

 

 

Functional Atmospheric Plasma Lab.

Bio-Plasma System

機械手臂

 

 

Login

Login Success