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Center Layout & Apparatus(1)

        CTFTA is a 3 story building with area of 1,056 m2. It contains 10 individual experimental sections, including Advanced physical Vapor Deposition Lab(Ⅰ),  Advanced Chemical Vapor Deposition Lab, Advanced physical Vapor Deposition Lab(), Thin Films & Mechanical Properties Testing Lab, Advanced Plasma Lab, Optoeletronic Measurement Lab, Industry Process Lab, Production Testing Equipment Lab, Solution Plasma Lab, as well as an office room and a multi-function meeting room.

 

 Advanced Chemical Vapor Deposition Lab.

Inductively Coupled Plasma-Chemical Vapor Deposition, ICP-CVD

 Plasma Enhanced -Chemical Vapor Deposition, PE-CVD

 

 Advanced Physical Vapor Deposition Lab.Ⅰ

 In- Line Physical Vapor Deposition

 Batch Type Physical Vapor Deposition

 

 

 Advanced Physical Vapor Deposition Lab.Ⅱ

High Power Impulse Magnetron Sputtering, HIPIMS

 

 Thin Films & Mechanical Properties Testing Lab.

Scratch Tester

Tribometer

Thin Film Impact Tester

 

Advanced Plasma Lab.

Plasma Polymerization System

 

Optoeletronic Measurement Lab.

Photoelectrochemical Measuring System

UV-Visible Spectrophotometer

 Atmospheric Plasma Treatment System

 

Industry Process Lab.

 Ion-Beam Assisted Deposition, IBAD

 Reactive Ion Etcher, RIE

 Deposition System

 Organic-inorganic hybrid coating system

 

Industry-Testing Equipment Lab.

3D print

Electro-spinning

 Hot filament plasma enhanced chemical vapor deposition, HF-PECVD

 

Solution Plasma Lab.

Solution Plasma System

 

 

Plasma Surface Engineering Lab.

 Hybrid Coating System

 

 

 

Functional Atmospheric Plasma Lab.

Bio-Plasma System

Denso Robot

 

 

 

Plasma Surface Engineering Lab.

 Hybrid Coating System

 

 

 

Functional Atmospheric Plasma Lab.

Bio-Plasma System

Denso Robot

 

 

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